

Since 1985, MATHESON NANOCHEM® purifiers have provided unprecedented ultrapurification solutions serving a wide range of industries including semiconductor manufacturing, LED production, energy processes, welding, and many more.
Gas | NANOCHEM Purification Media |
---|---|
Ar Argon | View Media |
AsH3 Arsine | View Media |
AsH3 Arsine (1-10%) | View Media |
BCl3 Boron Trichloride | View Media |
BF3 Boron Trifluoride | Contact Us for Details |
C2F6 Hexafluoroethane | View Media |
C2H2 Acetylene | View Media |
C2H4 Ethylene | Contact Us for Details |
C2H6 Ethane | View Media |
C3F6 Hexafluoropropylene | Contact Us for Details |
C3F8 Perfluoropropane | View Media |
C3H6 Propylene (Propene) | Contact Us for Details |
C3H6 Cyclopropane | View Media |
C3H8 Propane | View Media |
C4F10 Perfluorobutane | View Media |
C4F6 Hexafluorobutadiene | Contact Us for Details |
C4F8 Octafluorocyclobutane | Contact Us for Details |
C4H10 Butane | View Media |
C4H10 Isobutane | Contact Us for Details |
C4H8 Butene | Contact Us for Details |
C5F8 Octafluorocyclopentene | Contact Us for Details |
CCl2O Phosgene | Contact Us for Details |
CCl4 Carbon Tetrachloride | Contact Us for Details |
CDA Clean Dry Air | Contact Us for Details |
CF4 Carbon Tetrafluoride | View Media |
CH2F2 Difluoromethane | View Media |
CH3Cl Methyl Chloride | Contact Us for Details |
CH3SH Methyl Mercaptan | Contact Us for Details |
CH6Si Methyl Silane | Contact Us for Details |
CH4 Methane | View Media |
CH3F Methyl Fluoride | Contact Us for Details |
CHF3 Trifluoromethane | Contact Us for Details |
Chlorocarbons | Contact Us for Details |
Cl2 Chlorine | View Media |
CO Carbon Monoxide | View Media |
CO2 Carbon Dioxide | View Media |
COS Carbonyl Sulfide | Contact Us for Details |
CS2 Carbon Disulfide | Contact Us for Details |
Cyclo-hydrocarbons | Contact Us for Details |
D2 Deuterium | View Media |
Fluorocarbons | Contact Us for Details |
GeCl4 Germanium Tetrachloride | Contact Us for Details |
GeF4 Germanium Tetrafluoride | Contact Us for Details |
GeH4 Germane | Contact Us for Details |
GeH4 Germane (1-10%) | View Media |
H2 Hydrogen | View Media |
H2S Hydrogen Sulfide | Contact Us for Details |
H2Se Hydrogen Selenide | Contact Us for Details |
Halocarbons | View Media |
HBr Hydrogen Bromide | View Media |
HCl Hydrogen Chloride | View Media |
He Helium | View Media |
HF Hydrogen Fluoride | View Media |
Hydrocarbons | Contact Us for Details |
Kr Krypton | View Media |
N2 Nitrogen | View Media |
N2O Nitrous Oxide | View Media |
Ne Neon | View Media |
NH3 Ammonia | View Media |
NO Nitric Oxide | View Media |
NO2 Nitrogen Dioxide | Contact Us for Details |
O2 Oxygen | View Media |
O3 Ozone | Contact Us for Details |
PH3 Phosphine | View Media |
PH3 Phosphine (1-10%) | View Media |
SF6 Sulfur Hexafluoride | View Media |
Si2H6 Disilane | Contact Us for Details |
SiCl4 Silicon Tetrachloride | Contact Us for Details |
SiClH3 Monochlorosilane | Contact Us for Details |
SiCl2H2 Dichlorosilane | View Media |
SiCl3H2 Trichlorosilane | View Media |
SiF4 Silicon Tetrafluoride | Contact Us for Details |
SiH3CH3 Monomethyl Silane | View Media |
SiH4 Silane | View Media |
SO2 Sulfur Dioxide | Contact Us for Details |
Xe Xenon | View Media |
If a gas of interest to your application does not appear in this list, please Contact Us.
Gas Purification Optimized for Semiconductor Fabrication Applications.
NANOCHEM® Gas Purifiers enable the extreme purification of gases used in wafer and semiconductor fabrication, including the removal of dopants and volatile metals.
Live gas testing is done to ensure that Nanochem gas purifiers meet or exceed performance specifications in the specific gas for which they are marketed.
NANOCHEM® purifiers remove:
- moisture (water)
- hydrocarbons
- halocarbons
- carbon dioxide
- oxygen
- dopants
- volatile metals
- more
Please inquire regarding specific impurities of interest to your application.
Gas purification for welding applications is not limited to only the most demanding orbital welding applications. The fact is that gas contamination can interfere with welding performance in any application, and lead to oxidation, poor appearance, inconsistent bead appearance, and weld strength.
Gas purification is particularly beneficial in robotic welding, where it’s desirable to factor out as many variables as possible.
Of course, gas purification is essential in food, beverage, and medical applications.
Gas purification means less frequent operator intervention, fewer piece rejects, and better overall productivity.
WeldAssure™ Welding Gas Purifiers Features
- Up to 50 slpm (100 cfh, 3 NM3 /hr)
- Up to 200 psig (1.5 MPa)
- Built-in 1-valve (4-Way valve) bypass
- Check valve at outlet to protect canister media from air intrusion when gas flow is stopped
- Visual end-point detection
- Field-replaceable canister
- Brass components and disposable aluminum canister
- Optional refillable stainless canister
- Optional stainless components with stainless canister
Weld Knight™ Gas Purifier Features
- Up to 250 slpm (530 cfh, 15 NM3 /hr)
- Up to 200 psig (1.5 MPa)
- Built-in 1-valve (4-Way valve) bypass
- Check valve at outlet to protect canister media from air intrusion when gas flow is stopped
- Field-replaceable canister
- Refillable stainless steel canister
- Stainless valves and fittings
Read More about NANOCHEM welding solutions:
WeldAssure™ Gas Purifiers
Weld Knight™ Gas Purifiers
In current high-performance Metal Additive Manufacturing (3D Printing) applications, gas borne contamination can lead to problems with:
- Mechanical integrity of deposition
- Inconsistencies of deposition
- Purity of the printed structure itself
- Printing tool orifice clogging
- Other potential issues with the printed product and the printing equipment.
Point-of-use gas purification using MATHESON 3DPro™ NANOCHEM® Purifiers restores the purity of your gases by removing these rogue impurities, and, in turn, providing consistently high gas purity output at the printing tool.
Read more about 3DPro™ :
High Performance Sub-PPB Gas Purification for 3D Printing
Recirculating Expendable Purifier
NANOCHEM® Hardware Details and Specs
- NANOCHEM® Purifiers Overview
- Hardware Systems Overview
- PuriFilter® Gas Purifiers
- H/HP Series Gas Purifiers
- L-Series® Gas Purifiers
- L-Series® Purifier ByPass Module
- End-Point Detector
- WK-Series (White Knight™) Gas Purifiers
- WK-9000 (White Knight™) Gas Purifiers
- MegaShield™ Bulk Gas Purifiers
- A-300I Arsine and Phosphine Purifiers
- WeldAssure™ Gas Purifiers
- Weld Knight™ Gas Purifiers
- MAX™ High Flow High Pressure Gas Purifiers
NANOCHEM® Media Details and Specs
- NANOCHEM® Purifiers Overview
- Purification Media Overview
- INX™ Purification Medium for Oxygenated Impurities
- INX-Plus™ Purification Medium for Oxygenated Impurities and Hydrocarbons
- OMX-Plus™ Purification Medium for Inert and Flammable Gas Purifiers
- ASX-II™ Purification Medium for Arsine Gas Purifiers
- Metal-X™ Purification Medium for Corrosive Gas Purifiers
- HCX™ Purification Medium for Inert Gas Purifiers
- In2GO™ Purification Media for Inert Gas and Ammonia Purifiers
- Desicore™ Germane Gas Purifiers
- PURELITE™ Purification Medium-non DG