Nanochem Purification Overview

  1. Purification
  2. Nanochem Purification Overview
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Nanochem Gas Purifiers are designed for Ultra High Purity applications – including comprehensive solutions for source, point-of-use, bulk, and proximate purification – delivering up to nine 9’s purity gas.

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Since 1985, MATHESON Nanochem® purifiers have provided unprecedented purification solutions serving a wide range of industries including semiconductor manufacturing, LED production, energy processes, welding, and many more.

 

Nanochem UHP Gas Purification.

Learn more about Nanochem capabilities - get the Nanochem Purifier Overview Brochure.

Go to the Nanochem Product Data page on this website to learn more about Nanochem:

  • types of gas purification media
  • choices for purifier hardware configurations

 

Gas Purification:
High Performance Purification Media and Specialized Hardware.

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Nanochem® purifiers combine gas-specific purification media and ultra-high purity hardware in one system to eliminate impurities caused by:

  • Upstream leaks
  • Improper cylinder change-outs
  • Increasing impurity concentration during gas cylinder depletion
  • Gas system component contamination
  • Virtual leaks from component / piping "dead pockets" and soft seats

 

Gas Purification:
Long Purifier Lifetime and High Purifier Efficiency.

Nanochem® purifiers offer the highest lifetimes and the best efficiencies for impurity removal. Nanochem purifiers are available for:

  • Silicon-source gases
  • Nitride gases
  • Etchants
  • Purge gases
  • Dopant gases
  • Volatile metals
  • Carrier gases

 

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Remove oxygen, water, and other contaminants to UHP levels

Oxygen, moisture and other contaminants are removed to < 100 ppt (parts per trillion) and are limited only by the detection limits of even state-of-the-art analytical instrumentation.

Compact and easy to use, Nanochem® purifiers can be installed within the gas cabinet or at the process tool. Most purifiers require no heating or cooling and are capable of handling a broad range of flows and pressures.

MATHESON has one of the most extensive, in-house evaluation laboratories in the industry to assess the quality of gas system components. The benefit is that components selected for Nanochem® purification products are of the highest quality available.

"Live gas" testing is done to ensure purifiers meet or exceed performance specifications in the specific process gas for which they are marketed.

 

Gas Purification Performance Benefits & Applications

Nanochem® purifiers offer a number of benefits, such as reduced equipment downtime and protection against fluctuations in gas supply quality and upstream system upsets. Typical performance benefits for the semiconductor / compound semiconductor industry are:

  • Increased carrier concentration, increased mobility
  • Faster crystal growth rates
  • Improved uniformity of surface morphology
  • Fewer defects in epi layers and substrates
  • Longer equipment life & reduced component corrosion

Semiconductor applications include manufacture of ICs and high brightness LEDs. Welding applications include piping for semiconductor fabs, manufacture of aerospace components, and manufacture of process equipment for chemical and biotech industries.

 

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Looking for a technical paper or pdf not found on this page? Visit our Nanochem Technical Library.

 

 

 

Purification

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Gases We Purify (partial listing) 

Items are listed alphabetically by chemical formula. For the same list, sorted by chemical name, visit this page.

If the gas material of interest to you does not appear in this list, please contact us.

 Air Air
 Ar Argon
 Ar (weld) Argon (welding)
 AsH3 Arsine
 AsH3 Arsine (1-10%)
 BCl3 Boron Trichloride
 BF3 Boron Trifluoride
 C2F6 Hexafluoroethane
 C2H2 Acetylene
 C2H4 Ethylene
 C2H6 Ethane
 C3F6 Hexafluoropropylene
 C3F8 Octafluoropropane
 C3H6 Propylene
 C3H8 Propane
 C4F10 Perfluorobutane
 C4F6 Hexafluorobutadiene
 C4F8 Octafluorocyclobutane
 C4H10 Butane
 C4H10 Isobutane
 C4H8 Butene
 C5F8 Octafluorocyclopentene
 CCl2O Phosgene
 CCl4 Carbon Tetrachloride
 CDA Clean Dry Air
 CF4 Carbon Tetrafluoride
 CH2F2 Difluoromethane
 CH3Cl Methylchloride
 CH3SH MethylMercaptan
 CH3SiH3 Monomethyl Silane
 CH4 Methane
 CHF3 Methyl Fluoride
 CHF3 Trifluoromethane
 Chlorocarbons Chlorocarbons
 Cl2 Chlorine
 CO Carbon Monoxide
 CO2 Carbon Dioxide
 COS Carbonyl Sulfide
 CS2 Carbon Disulfide
 Cyclo-hydrocarbons Cyclo-hydrocarbons
 D2 Deuterium
 Fluorocarbons Fluorocarbons
 GeCl4 Germanium Tetrachloride
 GeF4 Germanium Tetrafluoride
 GeH4 Germane
 GeH4 Germane (1-10%)
 H2 Hydrogen
 H2S Hydrogen Sulfide
 H2Se Hydrogen Selenide
 Halocarbons Halocarbons
 HBr Hydrogen Bromide
 HCl Hydrogen Chloride
 He Helium
 HF Hydrogen Fluoride
 Hydrocarbons Hydrocarbons
 Kr Krypton
 N2 Nitrogen
 N2O Nitrous Oxide
 Ne Neon
 NH3 Ammonia
 NO Nitric Oxide
 NO2 Nitrogen Dioxide
 O2 Oxygen
 O3 Ozone
 PH3 Phosphine
 PH3 Phosphine (1-10%)
 SF6 Sulfur Hexafluoride
 Si2H6 Disilane
 SiCl4 Silicon Tetrachloride
 SiClH3 Monochlorosilane
 SiCl2H2 Dichlorosilane
 SiCl3H2 Trichlorosilane
 SiF4 Silicon Tetrafluoride
 SiH3CH3 Methyl Silane
 SiH4 Silane
 SO2 Sulfur Dioxide
 Xe Xenon